SemiAnalysis@SemiAnalysis_ · X在台积电北美技术研讨会上，卢博士介绍了A14节点中的NanoFlex Pro技术。相较于N2节点的NanoFlex技术使用双倍高度的“Merged OD”高单元来提升性能，但会因现代标准单元布局中的交替阱偏移要求而产生不可用的“半单元”间隙。A14的NanoFlex Pro将高单元高度降至短单元的1.5倍，使得两个高单元恰好能放入三个短单元的高度，从而消除了部分单元类型间的间隙，提高了布局密度和OD效率。该技术也将作为可选方案于2028年应用于新的N2U工艺，以提供更好性能和2-3%的逻辑密度增益。
What is NanoFlex Pro？
At TSMC's North America Technology Symposium， Dr. Lu shed light on NanoFlex Pro in their A14 node. While N2 NanoFlex used some double height "Merged OD" tall cells to boost performance， the offset requirements from the alternating wells in modern standard cell layouts meant there were many unusable "half-cell" gaps between the tall and short cell boundaries.
With A14 NanoFlex Pro， the tall cells are now only 1.5x the height of the short cell， so two tall cells can fit neatly into the height of three short cells. This eliminates some of the gaps between cell types， increasing layout density and OD efficiency （ratio of nanosheet width to cell height）.